Semiconductor cleaning technology: a necessary step to improve device performance

Semiconductor cleaning is a key process to ensure device quality and reliability. Minor contamination may affect performance. Cleaning methods include physical, chemical, high-purity water and dry methods.

Physical cleaning: ultrasonic, spray and ion beam cleaning.

Chemical cleaning: acid cleaning, alkali cleaning and solvent cleaning.

High-purity water cleaning: removes tiny particles, ions and organic matter.

Dry cleaning: Gas or plasma removes contaminants and avoids liquid cleaning agent residue.

Semiconductor cleaning is used in integrated circuit, photovoltaic and flat panel display manufacturing. As device size shrinks and functionality increases, cleaning requirements increase. Efficient cleaning improves performance, reduces costs and extends life.